Ra. Johnson et al., ADVANCED THIN-FILM SILICON-ON-SAPPHIRE TECHNOLOGY - MICROWAVE CIRCUITAPPLICATIONS, I.E.E.E. transactions on electron devices, 45(5), 1998, pp. 1047-1054
This paper reviews the prospects of thin-film silicon-on-sapphire (TFS
OS) CMOS technology in microwave applications in the 1-5 GHz regime an
d beyond and presents the first demonstration of microwave integrated
circuits based on this technology. MOSFET's optimized for microwave us
e, with 0.5-mu m optically defined gate lengths and a T-gate structure
, have f(t) values of 25 GHz (14 GHz) and f(max) values of 66 GHz (41
GHz) for n-channel (p-channel) devices and have noise figure values be
low 1 dB at 2 GHz, some of the best reported performance characteristi
cs of any silicon-based MOSFET's to date. On-chip spiral inductors exh
ibit quality factors above ten. Circuit performance compares favorably
with that of other CMOS-based technologies and approach performance l
evels similar to those obtained by silicon bipolar technologies. The r
esults demonstrate the significant potential of this technology for mi
crowave applications.