ADVANCED THIN-FILM SILICON-ON-SAPPHIRE TECHNOLOGY - MICROWAVE CIRCUITAPPLICATIONS

Citation
Ra. Johnson et al., ADVANCED THIN-FILM SILICON-ON-SAPPHIRE TECHNOLOGY - MICROWAVE CIRCUITAPPLICATIONS, I.E.E.E. transactions on electron devices, 45(5), 1998, pp. 1047-1054
Citations number
23
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
45
Issue
5
Year of publication
1998
Pages
1047 - 1054
Database
ISI
SICI code
0018-9383(1998)45:5<1047:ATST-M>2.0.ZU;2-7
Abstract
This paper reviews the prospects of thin-film silicon-on-sapphire (TFS OS) CMOS technology in microwave applications in the 1-5 GHz regime an d beyond and presents the first demonstration of microwave integrated circuits based on this technology. MOSFET's optimized for microwave us e, with 0.5-mu m optically defined gate lengths and a T-gate structure , have f(t) values of 25 GHz (14 GHz) and f(max) values of 66 GHz (41 GHz) for n-channel (p-channel) devices and have noise figure values be low 1 dB at 2 GHz, some of the best reported performance characteristi cs of any silicon-based MOSFET's to date. On-chip spiral inductors exh ibit quality factors above ten. Circuit performance compares favorably with that of other CMOS-based technologies and approach performance l evels similar to those obtained by silicon bipolar technologies. The r esults demonstrate the significant potential of this technology for mi crowave applications.