De. Ioannou et al., OPPOSITE-CHANNEL-BASED INJECTION OF HOT-CARRIERS IN SOI MOSFETS - PHYSICS AND APPLICATIONS, I.E.E.E. transactions on electron devices, 45(5), 1998, pp. 1147-1154
An extensive study of the recently observed opposite-channel-based inj
ection (OCBI) of hot-carriers in SOI MOSFET's is carried out by PISCES
numerical calculations. The study reveals similar patterns of injecti
on for partially-depleted (PD) and fully-depleted (FD) devices, althou
gh there are significant quantitative differences. Important differenc
es also exist when stressing the de,ice with the body floating versus
body grounded. The results demonstrate that when stressing one channel
, carriers can and are injected into the opposite gate. The results al
so demonstrate that under appropriate bias conditions pure electron/ho
le injection takes place, and establish these conditions. The practica
l significance of this ability to inject only electrons or only holes
in any desired sequence is illustrated by exploiting it to investigate
the time-power lan of interface state generation and to design a SOI
EEPROM cell with a back channel based erasing scheme.