VISUALIZATION OF PLASMA UNIFORMITY IN DRY-ETCHING USING THE IMAGING PLATE

Authors
ARITA K ETOH M ASANO T
Citation
K. Arita et al., VISUALIZATION OF PLASMA UNIFORMITY IN DRY-ETCHING USING THE IMAGING PLATE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(2), 1998, pp. 519-522
Citations number
9
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
16
Issue
2
Year of publication
1998
Pages
519 - 522
Database
ISI
SICI code
1071-1023(1998)16:2<519:VOPUID>2.0.ZU;2-B
Abstract
Monitoring two-dimensional plasma uniformity in dry etching process by using the imaging plate has been investigated. It was found that the distribution of photostimulated-luminescence intensity of the imaging plate correlates well with the distribution of the ion density in the plasma measured with a Langmuir probe. The effect of ultraviolet light from the plasma has been investigated by covering the imaging plate w ith a quartz wafer. It was found that the imaging plate senses ultravi olet light from the plasma whose intensity is correlated with the ion density in the bulk plasma. (C) 1998 American Vacuum Society. [S0734-2 11X(98)00602-7].