Wp. Kang et al., MICROPATTERN-GATED DIAMOND FIELD EMITTER ARRAY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(2), 1998, pp. 732-735
Gated diamond field emitter arrays with ultralow operating voltage and
high emission current have been developed. Two types of built-in gate
d diamond field emitters have been successfully fabricated: (i) a gate
d structure created by molding and self-align technique, and (ii) a ca
p-gated structure created by molding and electrostatic bonding. Depend
ing on the diamond tip's composition and surface treatment, high emiss
ion current at very low operating voltage (varying from <10 V to >10 V
) can be designed to meet various applications. The built-in gated dia
mond tips have a stable emission current at a fixed gate voltage. Curr
ent fluctuation is found to be about 1.1% for low emission current and
less than 10% for higher emission current. Emission stability is cons
iderably more stable than silicon emitters. (C) 1998 American Vacuum S
ociety. [S0734-211X(98)07002-4].