IONIZED-IMPURITY SCATTERING OF MAJORITY ELECTRONS IN SILICON

Citation
H. Kosina et G. Kaiblingergrujin, IONIZED-IMPURITY SCATTERING OF MAJORITY ELECTRONS IN SILICON, Solid-state electronics, 42(3), 1998, pp. 331-338
Citations number
26
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
42
Issue
3
Year of publication
1998
Pages
331 - 338
Database
ISI
SICI code
0038-1101(1998)42:3<331:ISOMEI>2.0.ZU;2-F
Abstract
The Brooks-Herring approach to ionized-impurity scattering overestimat es the low-held mobility of electrons in doped semiconductors. It reli es on a static single-site description of the carrier-impurity interac tion and on the first Born approximation. We present a consistent ioni zed-impurity scattering model which accounts for degenerate statistics , dispersive screening and two-ion scattering. The dielectric function is accurately approximated by a rational function. From the Schwinger scattering amplitude a correction to the first Born amplitude is deri ved. Plasmon scattering as another concentration dependent mechanism i s included. Despite the various physical effects taken into considerat ion the scattering model can be used in Monte Carlo transport calculat ions without any significant increase in computation time. Monte Carlo calculations of majority electron mobility in silicon are discussed, and good agreement with experimental data is found in the doping range [10(14), 10(20)] cm(-3). (C) 1998 Published by Elsevier Science Ltd. All rights reserved.