LOW-COST X-RAY CONFORMAL MASK USING DRY FILM RESIST

Authors
SHIH WP CHENG Y LIN CY HWANG GJ
Citation
Wp. Shih et al., LOW-COST X-RAY CONFORMAL MASK USING DRY FILM RESIST, Microelectronic engineering, 40(1), 1998, pp. 43-50
Citations number
10
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
40
Issue
1
Year of publication
1998
Pages
43 - 50
Database
ISI
SICI code
0167-9317(1998)40:1<43:LXCMUD>2.0.ZU;2-V
Abstract
A economical X-ray conformal mask manufactured by using a dry film pro cess is reported. The dry film (HITACHI H-N650) is used as the photore sist in the photolithography process. Tin/lead and gold were electropl ated as the X-ray absorber. The feasibility and limitations of the dry film process were addressed. Using this X-ray conformal mask in X-ray lithography, 1000 mu m thick PMMA microstructures were achieved to de monstrate the fidelity of this method.