ELECTRICAL CHARACTERISTICS OF RECTIFYING POLYCRYSTALLINE SILICON SILICON-CARBIDE HETEROJUNCTIONS

Citation
Jp. Henning et al., ELECTRICAL CHARACTERISTICS OF RECTIFYING POLYCRYSTALLINE SILICON SILICON-CARBIDE HETEROJUNCTIONS, Journal of electronic materials, 27(4), 1998, pp. 296-299
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
27
Issue
4
Year of publication
1998
Pages
296 - 299
Database
ISI
SICI code
0361-5235(1998)27:4<296:ECORPS>2.0.ZU;2-9
Abstract
This paper presents a study of the rectifying properties of heavily do ped polycrystalline silicon (polysilicon) on 4H silicon carbide (4H-Si C). Current properties and barrier heights were found using analysis o f the heterojunction. This revealed that Schottky analysis would be va lid for the large barrier height devices. Isotype and an-isotype devic es were fabricated on both p-type and n-type SiC and the electrical ch aracteristics were investigated using capacitance vs voltage measureme nts, current vs voltage measurements (I-V), and temperature I-V measur ements. Extraction of the barrier height, built-in potential, and Rich ardson constant were made and then compared to theoretical values for the heterojunction. Temperature I-V measurements demonstrated that the current transport mechanism is thermionic emission, confirming the va lidity of the Schottky diode model. The I-V characteristics show near ideal diode rectifying behavior and the capacitance-voltage characteri stics show ideal junction space charge modulation for all polysilicon/ SiC combinations. These experimental results match well with heterojun ction band-offset estimated barrier heights and demonstrate that the b arrier height of the polysilicon/4H SiC interface may be controlled by varying the polysilicon doping type.