NANOMETER-SCALE INVESTIGATION OF METAL-SIC INTERFACES USING BALLISTIC-ELECTRON-EMISSION MICROSCOPY

Citation
Hj. Im et al., NANOMETER-SCALE INVESTIGATION OF METAL-SIC INTERFACES USING BALLISTIC-ELECTRON-EMISSION MICROSCOPY, Journal of electronic materials, 27(4), 1998, pp. 345-352
Citations number
21
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
27
Issue
4
Year of publication
1998
Pages
345 - 352
Database
ISI
SICI code
0361-5235(1998)27:4<345:NIOMIU>2.0.ZU;2-D
Abstract
We report ballistic-electron emission microscopy (BEEM) investigation of Pd, Pt Schottky contacts on 6H-, 4H-SiC, and Pd/15R-SiC. Measured S chottky barrier heights of 6H- and 4H-SiC samples appear spatially uni form up to the fitting error due to noise (0.03-0.04 eV and 0.1-0.2 eV for 6H- and 4H-SiC, respectively). In 4H-SiC, we observed an addition al conduction band minimum (CBM) similar to 0.14 eV above the lowest C BM, which provide direct experimental verification of band theoretical calculation results. Additionally, we sometimes observed enhancement in ballistic transmittance over regions intentionally stressed by hot electron injection using BEEM. We also report recent results on Pd/15R -SiC sample indicating a higher CBM similar to 0.5 eV above the lowest CBM. In Pd/15R-SiC, interesting large variations in BEEM spectra at d ifferent locations were observed, possibly suggesting an inhomogeneous metal/semiconductor interface.