THIN-FILM MATERIALS AND MINIMUM THERMAL-CONDUCTIVITY

Citation
Sm. Lee et al., THIN-FILM MATERIALS AND MINIMUM THERMAL-CONDUCTIVITY, Microscale thermophysical engineering, 2(1), 1998, pp. 31-36
Citations number
11
Categorie Soggetti
Materials Science, Characterization & Testing","Engineering, Mechanical","Physics, Applied
ISSN journal
10893954
Volume
2
Issue
1
Year of publication
1998
Pages
31 - 36
Database
ISI
SICI code
1089-3954(1998)2:1<31:TMAMT>2.0.ZU;2-B
Abstract
The theoretical minimum thermal conductivity can be used to model heat transport in a wide variety of bulk and thin-film materials with stro ng atomic-scale disorder. To explore the possibility of using metastab le microstructures in thin-film materials to achieve significant reduc tions in conductivity, we present experimental results-obtained using the 3 omega method in the temperature range 77-400 R-on two novel syst ems. (I) The thermal conductivity of a low-dielectric-constant ''flowa ble oxide'' (HSiO1.5, hydrogen silsesquioxane) is greatly reduced rela tive to SiO2. (2) The thermal conductivity of stabilized zirconia /SiO 2 mrdtilayms is unchanged by solid-solid interfaces separated by nanom eter length scales.