OPTICAL PROXIMITY CORRECTION AND ITS APPLICATION TO CD CONTROL IN HIGH-SPEED MICROPROCESSORS

Authors
YEN A BURKHARDT M ILZHOEFER JR FLECK RG DU H RANDALL J
Citation
A. Yen et al., OPTICAL PROXIMITY CORRECTION AND ITS APPLICATION TO CD CONTROL IN HIGH-SPEED MICROPROCESSORS, Microelectronic engineering, 42, 1998, pp. 65-70
Citations number
17
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
42
Year of publication
1998
Pages
65 - 70
Database
ISI
SICI code
0167-9317(1998)42:<65:OPCAIA>2.0.ZU;2-2
Abstract
Feature distortion, linewidth variation, and line-end shortening in li thographic pattern transfer seriously affect circuit performance. Thes e so-called optical proximity effects are both optical and process rel ated. Optical proximity correction (OPC) aims at minimizing these effe cts by pre-distorting the patterns of the mask. In this article, we pr esent several approaches to OPC and the application of OPC to linewidt h control in patterning the Rate level of microprocessors.