ANALYSIS OF SUBWAVELENGTH SIZED OPC FEATURES

Citation
K. Adam et al., ANALYSIS OF SUBWAVELENGTH SIZED OPC FEATURES, Microelectronic engineering, 42, 1998, pp. 137-140
Citations number
4
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
ISSN journal
01679317
Volume
42
Year of publication
1998
Pages
137 - 140
Database
ISI
SICI code
0167-9317(1998)42:<137:AOSSOF>2.0.ZU;2-W
Abstract
Rigorous 3-D electromagnetic analysis is used to examine the actual ne ar field characteristics and assess the resulting effects on imaging o f light passing through serifs and hammer head line-ends in optical pr oximity correction (OPC) of photomasks. The simulation is carried out using the finite-difference time-domain simulator TEMPEST using up to 5 million nodes and 150 M of memory. OPC features which are contiguous and share sides with open features transmit very effectively, whereas OPC features which are isolated by chrome stringers or are cut-off by nearly touching chrome corners are much less effective and require ri gorous electromagnetic analysis.