Rigorous 3-D electromagnetic analysis is used to examine the actual ne
ar field characteristics and assess the resulting effects on imaging o
f light passing through serifs and hammer head line-ends in optical pr
oximity correction (OPC) of photomasks. The simulation is carried out
using the finite-difference time-domain simulator TEMPEST using up to
5 million nodes and 150 M of memory. OPC features which are contiguous
and share sides with open features transmit very effectively, whereas
OPC features which are isolated by chrome stringers or are cut-off by
nearly touching chrome corners are much less effective and require ri
gorous electromagnetic analysis.