INTERFEROMETRIC LITHOGRAPHY - FROM PERIODIC ARRAYS TO ARBITRARY PATTERNS

Interferometric lithography is a simple technology for the production of very small features. Using I-line wavelength laser sources (364-Mm Ar-ion or 355-nm tripled. YAG lasers) dense (1:1 line:space ratio) per iodic structures at 0.125-mu m have been demonstrated. Mix-and-match w ith optical lithography has been demonstrated. Imaging interferometric lithography, a true integration between optical and interferometric l ithographies, potentially provides a route to arbitrary structures wit h a resolution up to 130 mm (dense patterns) at I-line and 65 nm at a 193 nm exposure wavelength.