MICRO-TECHNOLOGY OF DENSELY SPACED NONCONVENTIONAL PATTERNS FOR SPACEAPPLICATIONS

Regular arrays of sub-0.5 mu m tips are of increasing interest, for ex ample, as field emitters, calibration structures, or, in our particula r case, as collector surfaces for sub-mu m dust particles in a space e xperiment. This contribution describes the preparation of 1 x 1 cm(2) arrays of micro columns with a high aspect ratio (10:1) and a diameter in thesub-micrometer range (150-300 nm). The process is based upon a chemically amplified novolak resist (CAR), electron beam lithography, and ECR plasma etching.