SURFACE-ROUGHNESS REDUCTION AND DIFFRACTION EFFICIENCY OPTIMIZATION FOR E-BEAM WRITTEN PHASE MASKS

Authors
LIU X THOMS S AITCHISON JS DELARUE RM WILLIAMS JAR EVERALL L BENNION I
Citation
X. Liu et al., SURFACE-ROUGHNESS REDUCTION AND DIFFRACTION EFFICIENCY OPTIMIZATION FOR E-BEAM WRITTEN PHASE MASKS, Microelectronic engineering, 42, 1998, pp. 199-202
Citations number
5
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
42
Year of publication
1998
Pages
199 - 202
Database
ISI
SICI code
0167-9317(1998)42:<199:SRADEO>2.0.ZU;2-V
Abstract
We report the control of surface relief grating parameters and roughne ss for phase masks produced using e-beam lithography (EBL) and reactiv e ion etching (RIE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency o f the zeroth and the two first order transmitted beams are discussed.