VERY-LOW CONTRAST X-RAY MASKS FOR HIGH-RESOLUTION PRINTING

Authors
CHEN Y SIMON G HAGHIRIGOSNET AM MANIN L LAUNOIS H
Citation
Y. Chen et al., VERY-LOW CONTRAST X-RAY MASKS FOR HIGH-RESOLUTION PRINTING, Microelectronic engineering, 42, 1998, pp. 275-278
Citations number
9
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
42
Year of publication
1998
Pages
275 - 278
Database
ISI
SICI code
0167-9317(1998)42:<275:VCXMFH>2.0.ZU;2-F
Abstract
We propose a scheme for high resolution soft-contact printing with ver y low contrast X-ray masks. The scheme is based on the strongly enhanc ed image contrast due to absorber edge effects. In addition to a numer ical analysis, we also investigate the mask fabrication with an absorb er thickness of 0.15 mu m (W) and the replication with synchrotron rad iation of ultra high density features.