SYSTEMATIC STUDIES OF FUNCTIONALIZED CALIXARENES AS NEGATIVE TONE ELECTRON-BEAM RESIST

We present a systematic study on properties of calix[n]arenes as a hig h resolution negative tone electron beam resist. From experiments chan ging the ring sizes of the calix[:n]arenes with n=4,6,8 as well as the functionalisation of the arenes we conclude that electron beam irradi ation causes the arenes to break up and link to other arenes or functi onalizing groups. This is confirmed by exposing resorcin[4]arene. We d emonstrate that this material also shows negative tone high resolution resist features, and patterns are transferred into silicon.