M. Siakavellas et al., MICRO-RAMAN CHARACTERIZATION OF STRESS-DISTRIBUTION WITHIN FREE STANDING MONOCRYSTALLINE AND POLYCRYSTALLINE SILICON MEMBRANES, Microelectronic engineering, 42, 1998, pp. 469-472
Stress measurements were performed in a free standing monocrystalline
cantilever and a polycrystalline silicon membrane suspended over a dee
p cavity, using micro-Raman spectroscopy. These micromechanical struct
ures were fabricated using porous silicon as a sacrificial layer. The
results show that the stress varies across the membrane and the cantil
ever, the level of stress in the latter being lower than in the membra
ne.