CONSTRUCTION OF MICROCOLUMN SYSTEM AND ITS APPLICATION TO NANOLITHOGRAPHY

We have constructed microcolumn sq stem that car. overcome the limitat ion of current e-beam lithography technology and tested them through e xperiments. Electron-optical lenses consist of multiple electrodes. Si licon electrodes have been fabricated bq micromachining technology and assembled with Pyres glass by anodic bonding. Electron-optical lens w as equipped in UHV(Ultra High Vacuum) chamber. We have observed the em ission characteristics of electrons from STM(Scanning Tunneling Micros cope) tip and performed lithography with focused electrons. PMMA(poly- methylmethacrylate) was used for e-beam resist and 0.13 mu m isolated line was delineated on PMMA(poly-methylmethacrylate) with the microcol umn system.