MONODISPERSE AEROSOL-PARTICLE DEPOSITION - PROSPECTS FOR NANOELECTRONICS

Nanometer-sized PbS particles are deposited in an electrostatic precip itator at atmospheric pressure on planar substrates with a rate of abo ut 10(11) cm(-2) h(-1). The low-cost aerosol apparatus consists of (i) particle generation by evaporation and subsequent coagulation, (ii) c harging the particles and selection in size by a Differential Mobility Analyzer (DMA), (iii) crystallisation in an annealing step, and final ly (iv) deposition of particles. Specular X-Ray diffraction and Transm ission Electron Microscopy (TEM) is used to study the size and morphol ogy of the PbS particles indicating that these particles are fully cry stalline with lattice constant of bulk PbS. Laterally selective partic le deposition (lithography) is aimed at by means of electrostatic cont rol of the charged particles in the gas-phase. Best results are obtain ed with an electrostatic mask provided simply by a photoresist pattern .