The behavior of Si donors was studied in AlxGa1-xN films with composit
ion 0 < x < 0.6. It is shown that the Si donors ionization energy incr
eases from 18 meV for 0 < x < 0.1 to about 50 meV for x = 0.4 and does
not exceed 90 meV for x = 0.6. Increase in Al composition is also acc
ompanied by the growth of the density of defects with energy levels de
eper than Si. Combined action of the two above effects leads to increa
sed difficulty in n-type doping of AlGaN films with higher Al mole fra
ctions. Persistent photoconductivity (PPC) is shown to be a characteri
stic feature of AlGaN samples of all compositions. It is shown that PP
C in AlGaN is related to the presence of centers with a relatively hig
h (0.1-0.2 eV) barrier for capture of electrons. In GaN and AlGaN with
x < 0.1 such centers are not associated with Si donors per se. (C) 19
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