Z. Gingl et al., BIASED PERCOLATION MODEL FOR THE ANALYSIS OF ELECTRONIC-DEVICE DEGRADATION, Microelectronics and reliability, 38(4), 1998, pp. 515-521
The biased percolation model is proposed for investigating device degr
adation and failure associated with the generation of defects due to l
ocal Joule heating. The degradation processes of a thin conducting or
semiconducting film is monitored by a set of relevant indicators, such
as: the evolution of damage pattern, the current distribution, the fi
lm resistance and its fluctuations, the defect concentration, the film
lifetime, etc. The conductor-insulator (CI) and conductor-superconduc
tor (CS) like degradation processes are considered. The results can be
used to propose non-destructive indicators to test the reliability of
samples and to interpret the corresponding experiments. (C) 1998 Else
vier Science Ltd. All rights reserved.