3-DIMENSIONAL MODELING OF THE HEAT-FLOW INTO A GAAS SUBSTRATE - INFLUENCE OF THERMAL PHENOMENA ON THE RF BEHAVIOR OF POWER HBTS AND TECHNOLOGICAL OPTIMIZATION
P. Souverain et al., 3-DIMENSIONAL MODELING OF THE HEAT-FLOW INTO A GAAS SUBSTRATE - INFLUENCE OF THERMAL PHENOMENA ON THE RF BEHAVIOR OF POWER HBTS AND TECHNOLOGICAL OPTIMIZATION, Microelectronics and reliability, 38(4), 1998, pp. 553-557
Using three-dimensional modeling of the heat flow into the substrate,
and taking into account the variation of thermal conductivity with tem
perature, we study the sensitivity of the thermal resistance R-TH to p
arameters such as the substrate thickness, its nature (GaAs, Si, AlN o
r diamond), the topology of the power source (length and width) or eve
n the power density. Thus, we show that the transfer of active GaAs la
yers onto a host substrate with a higher thermal conductivity such as
Si, AIN or diamond is of greater interest than the thinning of the sub
strate. We developed an accurate electrothermal model for the AlGaAs/G
aAs heterojunction bipolar transistor (HBT) allowing prediction of the
static and mainly dynamic (RF) behavior at a high signal operating mo
de. We show that if the HBT layers are transferred onto a diamond subs
trate, a 50% gain in RF power can be expected at 10 GHz. Finally, we p
resent the technological solutions investigated for the transfer and t
he heteroassembly of HBT active layers on substrates better suited for
thermal dissipation. (C) 1998 Elsevier Science Ltd. All rights reserv
ed.