R. Zhang et Tf. Kuech, HYDROGEN-INDUCED YELLOW LUMINESCENCE IN GAN GROWN BY HALIDE VAPOR-PHASE EPITAXY, Journal of electronic materials, 27(5), 1998, pp. 35-39
Strong yellow luminescence (YL) was found in GaN grown by the halide v
apor phase epitaxy technique, using an NH3-HCl-GaCl-N-2-H-2 growth che
mistry. The low-temperature (less than 100K) thermal activation energy
of the yellow luminescence was determined to be similar to 18 meV, wh
ich indicates that a shallow donor, rather than a 'shallow' acceptor,
was involved in observed radiative transition. The temperature depende
nce of the YL peak energy and the shape of the YL band imply that ther
e are multiple recombination channels involved in the YL band. The rat
io of integrated intensity of yellow-to-bandedge luminescence decrease
d with an increase of HCl (and hence GaCl and growth rate) in the grow
th ambient.