AVALANCHE MULTIPLICATION IN GAINP GAAS SINGLE-HETEROJUNCTION BIPOLAR-TRANSISTORS/

Citation
Rm. Flitcroft et al., AVALANCHE MULTIPLICATION IN GAINP GAAS SINGLE-HETEROJUNCTION BIPOLAR-TRANSISTORS/, I.E.E.E. transactions on electron devices, 45(6), 1998, pp. 1207-1212
Citations number
14
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
45
Issue
6
Year of publication
1998
Pages
1207 - 1212
Database
ISI
SICI code
0018-9383(1998)45:6<1207:AMIGGS>2.0.ZU;2-C
Abstract
The electron multiplication factors in GaInP/GaAs single heterojunctio n bipolar transistors (HBT's) have been measured as a function of base -collector bias for a range of GaAs collector doping densities. In the lowest doped (5 x 10(14) cm(-3)) thick collector the multiplication i s determined by the local electric held, As the collector doping incre ases, the measured multiplication is found to be significantly reduced at low values of multiplication from that predicted by the electric f ield profile. However, good agreement is always found at high multipli cation, close to breakdown, This reduction in multiplication at low el ectric fields is attributed to the dead space, the minimum distance ov er which carriers must travel before gaining the ionization threshold energy, A simple correction for the dead space is proposed, allowing t he multiplication to be accurately predicted even in heavily doped str uctures.