Rm. Flitcroft et al., AVALANCHE MULTIPLICATION IN GAINP GAAS SINGLE-HETEROJUNCTION BIPOLAR-TRANSISTORS/, I.E.E.E. transactions on electron devices, 45(6), 1998, pp. 1207-1212
The electron multiplication factors in GaInP/GaAs single heterojunctio
n bipolar transistors (HBT's) have been measured as a function of base
-collector bias for a range of GaAs collector doping densities. In the
lowest doped (5 x 10(14) cm(-3)) thick collector the multiplication i
s determined by the local electric held, As the collector doping incre
ases, the measured multiplication is found to be significantly reduced
at low values of multiplication from that predicted by the electric f
ield profile. However, good agreement is always found at high multipli
cation, close to breakdown, This reduction in multiplication at low el
ectric fields is attributed to the dead space, the minimum distance ov
er which carriers must travel before gaining the ionization threshold
energy, A simple correction for the dead space is proposed, allowing t
he multiplication to be accurately predicted even in heavily doped str
uctures.