An analytical model for the subthreshold slope of the accumulation-mod
e p-channeI SOI MOSFET is developed. The exact solution of the equatio
ns reveals that the subthreshold swing is slightly larger (by a few pe
rcent) than that of enhancement (inversion-mode) fully depleted SOI de
vices. In most cases, however, the classical subthreshold slope expres
sion developed for inversion-mode fully depleted SOI MOSFET can be use
d as a good approximation for accumulation-mode devices, which means t
hat the subthreshoId swing tends to the ideal value of S-0 = kT/q 1n(1
0) mV/dec if the buried oxide is sufficiently thick and if the interfa
ce trap density is sufficiently low.