ORIGIN OF SERIES RESISTANCES IN A-SI-H TFTS

Authors
Citation
Cy. Chen et J. Kanicki, ORIGIN OF SERIES RESISTANCES IN A-SI-H TFTS, Solid-state electronics, 42(5), 1998, pp. 705-713
Citations number
10
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
42
Issue
5
Year of publication
1998
Pages
705 - 713
Database
ISI
SICI code
0038-1101(1998)42:5<705:OOSRIA>2.0.ZU;2-L
Abstract
The origin of source/drain series resistances in amorphous silicon (a: Si:H) thin-film transistors (TFT) is analyzed based on a two-dimension al simulation of a-Si:H TFT and gated-four-probe (GFP) a-Si:H TFT stru ctures. The source/drain series resistances consist of the contact res istances between source/drain electrodes and n(+) a-Si:H film, n(+) a- Si:H film resistances, intrinsic a-Si:H bulk resistances, and the geom etrical resistances associated with the source/drain-gate overlaps. Th e influence of each component of series resistances on a-Si:H TFT elec trical performance is clearly described based on the results of two-di mensional simulation. Published by Elsevier Science Ltd.