WURTZITE GAN SURFACE-STRUCTURES STUDIED BY SCANNING-TUNNELING-MICROSCOPY AND REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION

Citation
Ar. Smith et al., WURTZITE GAN SURFACE-STRUCTURES STUDIED BY SCANNING-TUNNELING-MICROSCOPY AND REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1641-1645
Citations number
19
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
07342101
Volume
16
Issue
3
Year of publication
1998
Part
2
Pages
1641 - 1645
Database
ISI
SICI code
0734-2101(1998)16:3<1641:WGSSBS>2.0.ZU;2-L
Abstract
We report studies of the surface reconstructions for both the Ga-face and the N-face of wurtzite GaN films grown using molecular beam epitax y. N-face reconstructions are primarily adatom-on-adlayer structures w hich can be formed by room temperature submonolayer Ga deposition. The se structures undergo reversible order-disorder phase transitions to 1 X1 in the temperature range of 200-300 degrees C. Ga-face reconstructi ons, on the other hand, require annealing to high temperatures (600-70 0 degrees C) in order to form, and in most cases they are stable at th ose temperatures. The film polarity is found to be determined by the i nitial nucleation stage of the film growth. (C) 1998 American Vacuum S ociety.