PHOTOLUMINESCENCE QUENCHING OF ALQ(3) BY METAL-DEPOSITION - A SURFACEANALYTICAL INVESTIGATION

Citation
Ve. Choong et al., PHOTOLUMINESCENCE QUENCHING OF ALQ(3) BY METAL-DEPOSITION - A SURFACEANALYTICAL INVESTIGATION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1838-1841
Citations number
18
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
07342101
Volume
16
Issue
3
Year of publication
1998
Part
2
Pages
1838 - 1841
Database
ISI
SICI code
0734-2101(1998)16:3<1838:PQOABM>2.0.ZU;2-V
Abstract
The importance of the interfacial properties in organic light-emitting devices (OLED) is well recognized. We will describe our recent effort s to understand interfaces in OLEDs using surface/interface analytical techniques in a well controlled ultrahigh vacuum environment. We obse rved severe photoluminescence quenching of organic thin films comprisi ng of a model OLED material, namely tris-(8-hydroxyquinoline) aluminum (Alq(3)), upon deposition of a number of metals. Such quenching may s everely affect the electroluminescence device efficiency. We have inve stigated the interfaces using x-ray photoemission spectroscopy and ult raviolet photoemission spectroscopy, and studied the intriguing proces s of the interface formation at an atomic/molecular level. We will sho w that microscopic surface and interface properties are intimately rel ated to the device characteristics and performance. (C) 1998 American Vacuum Society.