Ve. Choong et al., PHOTOLUMINESCENCE QUENCHING OF ALQ(3) BY METAL-DEPOSITION - A SURFACEANALYTICAL INVESTIGATION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1838-1841
Citations number
18
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
The importance of the interfacial properties in organic light-emitting
devices (OLED) is well recognized. We will describe our recent effort
s to understand interfaces in OLEDs using surface/interface analytical
techniques in a well controlled ultrahigh vacuum environment. We obse
rved severe photoluminescence quenching of organic thin films comprisi
ng of a model OLED material, namely tris-(8-hydroxyquinoline) aluminum
(Alq(3)), upon deposition of a number of metals. Such quenching may s
everely affect the electroluminescence device efficiency. We have inve
stigated the interfaces using x-ray photoemission spectroscopy and ult
raviolet photoemission spectroscopy, and studied the intriguing proces
s of the interface formation at an atomic/molecular level. We will sho
w that microscopic surface and interface properties are intimately rel
ated to the device characteristics and performance. (C) 1998 American
Vacuum Society.