Wd. Getty et Jb. Geddes, SIZE-SCALABLE, 2.45-GHZ ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE USING PERMANENT-MAGNETS AND WAVE-GUIDE COUPLING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(1), 1994, pp. 408-415
A plasma is produced in 1-10 mTorr Ar using 200-700 W of power at 2.45
GHz in a 20-cm-diam vessel. Electron cyclotron resonance (ECR) condit
ions are produced with an array of permanent magnets arranged over the
surface of the dielectric waveguide window. No electromagnet coils ar
e used. The microwave circuit is nonresonant and can be easily matched
to the power source using an E-H waveguide tuner. The 20-cm-diam plas
ma is 16 cm long, and is surrounded mainly by grounded metal walls. Th
e plasma expands from the ECR source region at the window and complete
ly fills the chamber. Measurements of the electron density, electron t
emperature, and plasma space potential have been made as functions of
spatial position using Langmuir probes. The denSity ranges up to 6 x 1
0(11) cm-3 and the electron temperature is in the 2 eV range. The dens
ity axial and radial profiles are described by an ambipolar diffusion
model which accounts for ionization in the bulk plasma. By applying th
e same permanent magnet arrangement to a rectangular waveguide, rectan
gular modules can be made which can be arranged in an array to produce
a large-area plasma source with independent power control for each wa
veguide channel.