ELECTRON-EMISSION FROM PATTERNED DIAMOND FLAT CATHODES

Authors
TOLT ZL FINK RL YANIV Z
Citation
Zl. Tolt et al., ELECTRON-EMISSION FROM PATTERNED DIAMOND FLAT CATHODES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1197-1198
Citations number
4
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
16
Issue
3
Year of publication
1998
Pages
1197 - 1198
Database
ISI
SICI code
1071-1023(1998)16:3<1197:EFPDFC>2.0.ZU;2-Z
Abstract
A substrate predesposition treatment process is used to pattern and en hance the emission properties of diamond flat cathode films. An advant age of this process is that the diamond grit abrasive process steps ar e not required for the enhanced emission properties. The predespositio n treatment also eliminates the possibility of degrading cathode perfo rmance resulting from postgrowth processes.