HAFNIUM CARBIDE FILMS AND FILM-COATED FIELD-EMISSION CATHODES

Citation
Wa. Mackie et al., HAFNIUM CARBIDE FILMS AND FILM-COATED FIELD-EMISSION CATHODES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1215-1218
Citations number
8
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
ISSN journal
10711023
Volume
16
Issue
3
Year of publication
1998
Pages
1215 - 1218
Database
ISI
SICI code
1071-1023(1998)16:3<1215:HCFAFF>2.0.ZU;2-2
Abstract
We have previously reported on field emission improvements, in turn-on voltages and emission stability using ZrC films as coatings on Si and Mo single emitters and emitter arrays. However, during our emission s tudies of bulk carbides, HfC was found to be slightly superior. We now report on work in progress investigating HfC films and HfC film coate d field emission cathodes. Uses for arrays of these field emission cat hodes range from video displays to microwave applications. This articl e deals with physical vapor deposition of HfC, absolute work function measurements, and electron emission properties of these film surfaces. This work demonstrates improvements by using HfC films over films of ZrC and an associated surface work function lowering of more than 1 eV in some instances compared to the clean surface. (C) 1998 American Va cuum Society.