Sa. Nikishin et al., LUMINESCENCE OF GAN GAAS(111)B GROWN BY MOLECULAR-BEAM EPITAXY WITH HYDRAZINE/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1289-1292
Hexagonal GaN layers were grown on (111)B GaAs substrates by gas-sourc
e molecular beam epitaxy using hydrazine as a source of nitrogen. A sm
ooth and abrupt AlN/GaAs interface was prepared by nitridation of an A
lAs buffer layer grown on clean GaAs(lll)B surface. This buffer layer
is stable at growth temperatures above 700 degrees C. The AlN layer pr
epared on this buffer exhibits two-dimensional growth. The subsequent
GaN and GaInN layers show a quasi-two-dimensional growth. The photo-an
d cathodoluminescence spectra of these samples show a narrow (similar
to 160 meV) band-edge emission and the absence of the ''yellow'' defec
t band. Further narrowing (similar to 20 meV) of the edge emission in
unintentionally In-doped GaN is ascribed to the presence of confined d
omains of Ga1-xInxN. (C) 1998 American Vacuum Society.