LUMINESCENCE OF GAN GAAS(111)B GROWN BY MOLECULAR-BEAM EPITAXY WITH HYDRAZINE/

Citation
Sa. Nikishin et al., LUMINESCENCE OF GAN GAAS(111)B GROWN BY MOLECULAR-BEAM EPITAXY WITH HYDRAZINE/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1289-1292
Citations number
14
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
ISSN journal
10711023
Volume
16
Issue
3
Year of publication
1998
Pages
1289 - 1292
Database
ISI
SICI code
1071-1023(1998)16:3<1289:LOGGGB>2.0.ZU;2-3
Abstract
Hexagonal GaN layers were grown on (111)B GaAs substrates by gas-sourc e molecular beam epitaxy using hydrazine as a source of nitrogen. A sm ooth and abrupt AlN/GaAs interface was prepared by nitridation of an A lAs buffer layer grown on clean GaAs(lll)B surface. This buffer layer is stable at growth temperatures above 700 degrees C. The AlN layer pr epared on this buffer exhibits two-dimensional growth. The subsequent GaN and GaInN layers show a quasi-two-dimensional growth. The photo-an d cathodoluminescence spectra of these samples show a narrow (similar to 160 meV) band-edge emission and the absence of the ''yellow'' defec t band. Further narrowing (similar to 20 meV) of the edge emission in unintentionally In-doped GaN is ascribed to the presence of confined d omains of Ga1-xInxN. (C) 1998 American Vacuum Society.