Hc. Kuo et al., STRUCTURAL AND OPTICAL-PROPERTIES OF 1.3 MU-M WAVELENGTH INASP INP/INGAP STRAIN-COMPENSATED MULTIPLE-QUANTUM-WELL MODULATORS GROWN BY GAS-SOURCE MOLECULAR-BEAM EPITAXY/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1377-1380
We present in this article a comparison of 1.3 mu m InAs0.45P0.55/In0.
81Ga0.19P strain-compensated multiple quantum well (SC-MQW) modulators
with and without an InP insertion layer. Material quality was evaluat
ed by cross-sectional transmission electron microscope analysis, x-ray
rocking curves with dynamical simulations, and photoluminescence meas
urements. Devices were fabricated and device performance criteria such
as contrast ratio (C.R.) and uniformity were also compared. It was fo
und that higher C.R. and highly uniform InAsP/InGaP SC-MQW modulators
can be achieved by inserting thin InP layers at the heterointerfaces b
etween InAsP and InGaP. (C) 1998 American Vacuum Society.