REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION DURING SUBSTRATE ROTATION- A NEW DIMENSION FOR IN-SITU CHARACTERIZATION

Citation
W. Braun et al., REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION DURING SUBSTRATE ROTATION- A NEW DIMENSION FOR IN-SITU CHARACTERIZATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1507-1510
Citations number
17
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
ISSN journal
10711023
Volume
16
Issue
3
Year of publication
1998
Pages
1507 - 1510
Database
ISI
SICI code
1071-1023(1998)16:3<1507:RHEDSR>2.0.ZU;2-T
Abstract
We present two methods to access reciprocal space with reflection high -energy electron diffraction (RHEED) during substrate rotation. The ex traction of an arbitrary number of still frames from a continuously ch anging RHEED pattern is realized by triggering the substrate rotation and it allows analysis of quasistatic RHEED patterns that are updated every revolution. At the same time, the intensity along a line paralle l to the shadow edge can be used to reconstruct a planar cut through t he reciprocal lattice similar to a low-energy electron diffraction pat tern. This RHEED pattern directly reveals the symmetry of the surface reconstruction and its changes during the deposition process. (C) 1998 American Vacuum Society.