NEW STRAIN-RELIEVING MICROSTRUCTURE IN PURE-GE SI SHORT-PERIOD SUPERLATTICES/

Citation
H. Sunamura et al., NEW STRAIN-RELIEVING MICROSTRUCTURE IN PURE-GE SI SHORT-PERIOD SUPERLATTICES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1595-1598
Citations number
18
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
ISSN journal
10711023
Volume
16
Issue
3
Year of publication
1998
Pages
1595 - 1598
Database
ISI
SICI code
1071-1023(1998)16:3<1595:NSMIPS>2.0.ZU;2-Q
Abstract
High-temperature formation of highly strained pure-Ge/Si short-period superlattices (SPSs) and their photoluminescence (PL) properties are p resented. We grew 99 period SPSs consisting of two-dimensional Ge laye rs separated by thin Si barriers. The evolution of undulations is newl y observed for samples with small Si barrier thickness, which is attri buted to a strain-related growth phenomenon, and similarities to the w ell-established island formation are discussed. Clear band-edge PL is observed in these high-temperature grown SPSs, and interesting PL prop erties associated with the undulation formation are presented. (C) 199 8 American Vacuum Society.