H. Sunamura et al., NEW STRAIN-RELIEVING MICROSTRUCTURE IN PURE-GE SI SHORT-PERIOD SUPERLATTICES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1595-1598
High-temperature formation of highly strained pure-Ge/Si short-period
superlattices (SPSs) and their photoluminescence (PL) properties are p
resented. We grew 99 period SPSs consisting of two-dimensional Ge laye
rs separated by thin Si barriers. The evolution of undulations is newl
y observed for samples with small Si barrier thickness, which is attri
buted to a strain-related growth phenomenon, and similarities to the w
ell-established island formation are discussed. Clear band-edge PL is
observed in these high-temperature grown SPSs, and interesting PL prop
erties associated with the undulation formation are presented. (C) 199
8 American Vacuum Society.