CHARACTERIZATION OF STRAINED SI SI1-YCY STRUCTURES PREPARED BY MOLECULAR-BEAM EPITAXY/

Citation
Kb. Joelsson et al., CHARACTERIZATION OF STRAINED SI SI1-YCY STRUCTURES PREPARED BY MOLECULAR-BEAM EPITAXY/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1621-1626
Citations number
32
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
ISSN journal
10711023
Volume
16
Issue
3
Year of publication
1998
Pages
1621 - 1626
Database
ISI
SICI code
1071-1023(1998)16:3<1621:COSSSS>2.0.ZU;2-Y
Abstract
Various structures containing Si1-yCy alloy layers have been prepared and characterized by x-ray diffraction , cross sectional transmission electron microscopy, photoluminescence (PL), Fourier transform infrare d spectroscopy, and spectroscopic ellipsometry. A band gap reduction e qual to 63 meV/% C has been estimated from PL when taking into account the quantum well (QW) confinement shift using an effective mass calcu lation. The QW-related emission observed from a multiple QW structure has a temperature quenching behavior with an activation energy equal t o 8 meV. Carbon outdiffusion from the QWs has been evidenced by a blue shift of the PL peak and changes in the x-ray diffraction data after f urnace annealing at 800 and 850 degrees C. (C) 1998 American Vacuum So ciety.