S. Dakshinamurthy et I. Bhat, MONITORING OF CDTE ATOMIC LAYER EPITAXY USING IN-SITU SPECTROSCOPIC ELLIPSOMETRY, Journal of electronic materials, 27(6), 1998, pp. 521-526
Atomic layer epitaxy or ALE has proven to be useful for the growth of
epitaxial layers of high uniformity, good quality, and well-controlled
thickness. In this study, we have carried out in-situ monitoring duri
ng the atmospheric pressure ALE of CdTe on GaAs (100) substrates using
spectroscopic ellipsometry (SE). The susceptor temperature, reactant
partial pressures, as well as the flow and flush duration for each pre
cursor are crucial process variables for ALE growth. Growth was carrie
d out for 20-25 cycles under different sets of these process condition
s during the experiment and in-situ SE was used to verify the presence
of layer-by-layer growth, which enabled the quick determination of th
e process window. We observed ALE growth of CdTe at 300 degrees C, sup
porting the explanation that the growth of CdTe occurs via a surface c
atalyzed decomposition of the Te precursor di-isopropyltelluride (DIPT
e). Investigation of ALE mode growth behavior for different susceptor
temperatures and DIPTe flush times indicated that the growth was limit
ed by competition between desorption and reaction of the adsorbed DIPT
e species on the Cd terminated surface.