MERCURY INTERSTITIAL GENERATION IN ION-IMPLANTED MERCURY CADMIUM TELLURIDE

Citation
Bl. Williams et al., MERCURY INTERSTITIAL GENERATION IN ION-IMPLANTED MERCURY CADMIUM TELLURIDE, Journal of electronic materials, 27(6), 1998, pp. 583-588
Citations number
13
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
27
Issue
6
Year of publication
1998
Pages
583 - 588
Database
ISI
SICI code
0361-5235(1998)27:6<583:MIGIIM>2.0.ZU;2-7
Abstract
Junction formation and stability in ion implanted mercury cadmium tell uride critically depend on the ability to generate Hg interstitials. T he creation of Hg interstitials is found to strongly depend on the pre ferred lattice position of the element implanted. Elements that substi tute onto the cation sublattice create significantly more Hg interstit ials than elements that sit interstitially or on the anion sublattice. Recoils from implant damage also contribute to Hg interstitial format ion in heavier mass implants (Z greater than or equal to of mass Zn), but appear to have negligible influence on interstitial generation in implants of lighter ions. The combination of implanting ions of large mass and high solubility on the cation sublattice produces strong Hg i nterstitial sources. Implants with these ions can form deep junctions even in heavily doped substrates. Junction stability is also improved with the stronger interstitial source.