HGCDTE-MISFET FABRICATION WITH MULTISTEP SURFACE PASSIVATION AND QUANTUM EFFECTS

Citation
Ch. Lee et al., HGCDTE-MISFET FABRICATION WITH MULTISTEP SURFACE PASSIVATION AND QUANTUM EFFECTS, Journal of electronic materials, 27(6), 1998, pp. 668-671
Citations number
10
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
27
Issue
6
Year of publication
1998
Pages
668 - 671
Database
ISI
SICI code
0361-5235(1998)27:6<668:HFWMSP>2.0.ZU;2-B
Abstract
We have used multi-step surface passivation process integrating electr ochemical reduction and W exposure with native sulfidization by H2S ga s to obtain high quality ZnS/p-HgCdTe interface. It shows very low par asitic interface charge density of the order of 10(10)cm(-2). The insu lating ZnS layer also exhibits very high resistivity of similar to 10( 12) Ohm cm. The resulting fabricated HgCdTe-MISFETs show 2D quantum ef fects. magnetoresistance measured at 1.5K displays oscillations which begin to appear above the gate voltage of 10V. They are identified as the Shubnikov-de Haas oscillations involving three electronic subbands .The magnetotransport data are quantitatively analyzed with the calcul ated Landau level-fan diagram and confirm the 2D subband quantization of the inversion layer at the ZnS/p-HgCdTe interface. This result demo nstrates successful role of the multi-step surface passivation for rea lizing 2D ZnS/HgCdTe interface which will provide high quality 2DEG re sevoir basis in future Hg-based narrow-gap nanostructure device applic ations.