COMPARISON BETWEEN MONOMETHYL HYDRAZINE AND ECR PLASMA ACTIVATED NITROGEN AS A NITROGEN-SOURCE FOR CBE GROWTH OF GAN

Monomethyl hydrazine (MMHy) was investigated as a nitrogen source for GaN CBE growth in comparison to ECR plasma excited nitrogen sources. T he growth rate of GaN on (0 0 1)GaAs was comparable with the highest g rowth rate by the ECR plasma excited nitrogen source, though the growt h rate depends on the plasma gun structure. Unexpectedly, the carbon a nd oxygen contamination was more serious for the ECR plasma nitrogen s ource than for MMHy, especially for the ECR plasma without an ion remo val magnet. (C) 1998 Elsevier Science B.V. All rights reserved.