STRONG PHOTOLUMINESCENCE EMISSION FROM GAN GROWN ON AMORPHOUS SILICA SUBSTRATES BY GAS-SOURCE MBE

Citation
K. Iwata et al., STRONG PHOTOLUMINESCENCE EMISSION FROM GAN GROWN ON AMORPHOUS SILICA SUBSTRATES BY GAS-SOURCE MBE, Journal of crystal growth, 188(1-4), 1998, pp. 98-102
Citations number
11
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
188
Issue
1-4
Year of publication
1998
Pages
98 - 102
Database
ISI
SICI code
0022-0248(1998)188:1-4<98:SPEFGG>2.0.ZU;2-U
Abstract
GaN layers are grown on amorphous fused silica glass substrates by gas source MBE using an ion removed electron cyclotron resonance (ECR) ra dical cell. Reflection high-energy electron diffraction (RHEED) and X- ray diffraction measurements reveal that they are polycrystalline. How ever, they show a strong photoluminescence emission peak without deep level emission. The emission peak is red-shifted by about 150 meV from that of the excitonic emission peak of GaN grown on a sapphire substr ate and has wide spectral half-width (similar to 250 meV at 77 K). The peak is not corresponding to the donor-acceptor pair (DAP) emission b ut is excitonic from the excitation power and temperature dependence o f PL spectrum. These optical properties indicate that GaN layers grown on a glass substrate are promising for fabrication of large area and low cost light emitting devices and solar cells. (C) 1998 Elsevier Sci ence B.V. All rights reserved.