In r.f. inductively coupled plasma (r.f.-ICP) nitriding, the nitriding
of iron is prevented by the addition of hydrogen. However, in this st
udy, the r.f.-ICP nitriding of iron surface was achieved by the applic
ation of negative bias voltage even in the presence of hydrogen. It se
ems that the effect of bias voltage overcomes the additive effect of h
ydrogen. Furthermore, the r.f.-ICP nitriding of SUS304 in the presence
of hydrogen was investigated. At 550 degrees C, the nitriding was sup
pressed by the addition of hydrogen, as well as the nitriding of iron.
However, the nitriding was promoted by the addition of hydrogen at 35
0 degrees C, and a hard nitrided layer was obtained. On the contrary,
SUS304 was not nitrided without hydrogen at 350 degrees C. (C) 1998 El
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