THIN-FILMS FORMED BY SINGLE AND DUAL-ION BEAM DEPOSITION OF POSITIVE AND NEGATIVE-IONS (AU- AND N+)

Citation
C. Heck et al., THIN-FILMS FORMED BY SINGLE AND DUAL-ION BEAM DEPOSITION OF POSITIVE AND NEGATIVE-IONS (AU- AND N+), Materials chemistry and physics, 54(1-3), 1998, pp. 247-250
Citations number
6
Categorie Soggetti
Material Science
ISSN journal
02540584
Volume
54
Issue
1-3
Year of publication
1998
Pages
247 - 250
Database
ISI
SICI code
0254-0584(1998)54:1-3<247:TFBSAD>2.0.ZU;2-M
Abstract
Ion beam deposition (IBD) is a thin film production method for direct deposition of low-energy mass-analyzed ions. The mass-analyzed beam ac ts as an exceptionally clean particle source which, when combined with an ultra-high vacuum (UHV) deposition chamber, results in very high p urity structures. The IBD technology has been applied for deposition o f single Au-, single N+ and dual Au- and Nt depositions on glassy C su bstrates. For the first time, the growth of Au islands on C by single Au- or dual Au- and N+ deposition is reported. (C) 1998 Elsevier Scien ce S.A. All rights reserved.