C. Heck et al., THIN-FILMS FORMED BY SINGLE AND DUAL-ION BEAM DEPOSITION OF POSITIVE AND NEGATIVE-IONS (AU- AND N+), Materials chemistry and physics, 54(1-3), 1998, pp. 247-250
Ion beam deposition (IBD) is a thin film production method for direct
deposition of low-energy mass-analyzed ions. The mass-analyzed beam ac
ts as an exceptionally clean particle source which, when combined with
an ultra-high vacuum (UHV) deposition chamber, results in very high p
urity structures. The IBD technology has been applied for deposition o
f single Au-, single N+ and dual Au- and Nt depositions on glassy C su
bstrates. For the first time, the growth of Au islands on C by single
Au- or dual Au- and N+ deposition is reported. (C) 1998 Elsevier Scien
ce S.A. All rights reserved.