THE PRODUCTION AND PROPERTIES OF TIN-NI NANOSTRUCTURE FILMS BY FILTERED VACUUM-ARC DEPOSITION

Nanostructure films, consisting of TiN and Ni, were obtained by filter ed vacuum are deposition. The TiN-Ni nanostructure film is expected to have superior mechanical properties. In this method, Ti metal ions an d Ni metal ions were alternately introduced to the substrate along a m agnetic field sustained in the quarter-torus. The nanoparticle structu re and the multilayer structure could be obtained. The TED pattern ind icated that the crystallographic orientations of TiN and Ni were align ed, TiN (111)//Ni (111), TiN (100)//Ni (100). The thermal stability of the nanostructure and the film hardness were investigated up to 1053 K. It was confirmed that the nanostructure and the film hardness were stable up to 973 K. The nanostructure was effective for improvement of hardness. (C) 1998 Elsevier Science S.A. All rights reserved.