CHARACTERIZATION OF CARBON NITRIDE FILMS PRODUCED BY SIMULTANEOUS LOW-ENERGY DUAL-ION BEAMS IRRADIATION

Authors
TSUBOUCHI N HORINO Y ENDERS B CHAYAHARA A KINOMURA A FUJII K
Citation
N. Tsubouchi et al., CHARACTERIZATION OF CARBON NITRIDE FILMS PRODUCED BY SIMULTANEOUS LOW-ENERGY DUAL-ION BEAMS IRRADIATION, Materials chemistry and physics, 54(1-3), 1998, pp. 325-329
Citations number
24
Categorie Soggetti
Material Science
Journal title
Materials chemistry and physics → ACNP
ISSN journal
02540584
Volume
54
Issue
1-3
Year of publication
1998
Pages
325 - 329
Database
ISI
SICI code
0254-0584(1998)54:1-3<325:COCNFP>2.0.ZU;2-T
Abstract
CN films were deposited using simultaneously positive N-14(+) and nega tive C-12(2)- ions (50-400 eV) under high vacuum condition. The film s tructure and the C-N bonding states in the films were investigated as a function of kinetic energy combinations of C-2(-) and N+ through Rut herford backscattering spectrometry (RBS), Fourier transform infrared absorption spectroscopy (FTIR) and Raman scattering results. The film structure was amorphous carbon-like. The order of carbon network and a fraction of various kinds of C-C and C-N bonds in the films were foun d to be correlated with the kinetic energy of NC ions. (C) 1998 Elsevi er Science S.A. All rights reserved.