THE MICROSTRUCTURE OF TRANSPARENT AND ELECTRICALLY CONDUCTING TITANIUM NITRIDE FILMS

Authors
KIUCHI M CHAYAHARA A TARUTANI M TAKAI Y SHIMIZU R
Citation
M. Kiuchi et al., THE MICROSTRUCTURE OF TRANSPARENT AND ELECTRICALLY CONDUCTING TITANIUM NITRIDE FILMS, Materials chemistry and physics, 54(1-3), 1998, pp. 330-333
Citations number
11
Categorie Soggetti
Material Science
Journal title
Materials chemistry and physics → ACNP
ISSN journal
02540584
Volume
54
Issue
1-3
Year of publication
1998
Pages
330 - 333
Database
ISI
SICI code
0254-0584(1998)54:1-3<330:TMOTAE>2.0.ZU;2-S
Abstract
The microstructure of electrically conducting and transparent titanium nitride (TiN) films, produced by the dynamic ion beam mixing techniqu e, have been studied. These films consist of small grains of TiN and a n amorphous layer. The film is continuous and does not react with the substrate. This paper discusses the morphology and properties of TiN f ilms and their nucleation process. (C) 1998 Elsevier Science S.A. All rights reserved.