HIGH-ENERGY COIMPLANTATION OF TI AND O IONS INTO SAPPHIRE

Citation
S. Nakao et al., HIGH-ENERGY COIMPLANTATION OF TI AND O IONS INTO SAPPHIRE, Materials chemistry and physics, 54(1-3), 1998, pp. 342-345
Citations number
12
Categorie Soggetti
Material Science
ISSN journal
02540584
Volume
54
Issue
1-3
Year of publication
1998
Pages
342 - 345
Database
ISI
SICI code
0254-0584(1998)54:1-3<342:HCOTAO>2.0.ZU;2-Z
Abstract
Optical and structural changes of sapphire(0001) substrates implanted with Ti ions or with Ti and O ions and subjected to thermal annealing, are examined by optical absorption, RBS-channeling and XRD measuremen ts. The transmittance of the co-implanted sample was larger than that of the Ti-implanted sample. After annealing at 1000 degrees C, rutile- type TiO2 microcrystals with (200) orientation were formed in the coim planted sample of Ti and O ions. Furthermore, a broad optical absorpti on at 220-340 nm in the co-implanted sample was increased after the an nealing. This was possibly due to the formation of TiO2 microcrystals in the sapphire substrate. In contrast to this result, no evidence of the formation of titanium oxide in a crystal structure was obtained fo r the Ti-implanted sample after the annealing. (C) 1998 Elsevier Scien ce S.A. All rights reserved.