Wide temperature range nitridation of GaAs(1 1 1) substrates by DMHy w
ith As-4 molecular beam have been investigated to convert GaAs to GaN.
The nitridation rate strongly depends on the pressures of the DMHy an
d the As4 beams and the substrate temperature. The nitridation even at
higher temperature range for the GaAs substrates is possible by using
simultaneous supply of the DMHy and the As-4 beams. The RHEED from th
e nitrided layers of the GaAs(1 1 1) B substrates shows a strong zincb
lende pattern mixed with a weak wurtzite one in the investigated tempe
rature range, in contrast to the case of the nitridation for the GaAs(
1 1 1) A substrates in which the RHEED shows a wurtzite one only. The
results indicate that the nitridation process can be controlled by the
simultaneous supply of the DMHy and the As-4 beams. (C) 1998 Elsevier
Science B.V. All rights reserved.