T. Yamamoto et H. Katayamayoshida, ELECTRONIC-STRUCTURES OF P-TYPE GAN CODOPED WITH BE OR MG AS THE ACCEPTORS AND SI OR O AS THE DONOR CODOPANTS, Journal of crystal growth, 190, 1998, pp. 532-536
We have investigated the interactions between p-type dopants (Be and M
g) and n-type codopants (Si and O) in p-type codoped GaN using first-p
rinciples calculations. Our results reveal that the co-incorporation o
f Be(Mg)(Ga) with O-N or Si-Ga in codoped p-type GaN produces high Be(
Mg) concentrations with stable ionic charge distributions markedly due
to a decrease In the Madelung energy in contrast to p-type GaN doped
with only Be(Mg). Our calculations thus predict that the ''codoping me
thod (doping n- and p-type dopants at the same time)'' is effective fo
r the fabrication of high-conductivity p-type GaN with a wurtzite stru
cture. (C) 1998 Elsevier Science B.V. All rights reserved.