ELECTRONIC-STRUCTURES OF P-TYPE GAN CODOPED WITH BE OR MG AS THE ACCEPTORS AND SI OR O AS THE DONOR CODOPANTS

Citation
T. Yamamoto et H. Katayamayoshida, ELECTRONIC-STRUCTURES OF P-TYPE GAN CODOPED WITH BE OR MG AS THE ACCEPTORS AND SI OR O AS THE DONOR CODOPANTS, Journal of crystal growth, 190, 1998, pp. 532-536
Citations number
18
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
190
Year of publication
1998
Pages
532 - 536
Database
ISI
SICI code
0022-0248(1998)190:<532:EOPGCW>2.0.ZU;2-A
Abstract
We have investigated the interactions between p-type dopants (Be and M g) and n-type codopants (Si and O) in p-type codoped GaN using first-p rinciples calculations. Our results reveal that the co-incorporation o f Be(Mg)(Ga) with O-N or Si-Ga in codoped p-type GaN produces high Be( Mg) concentrations with stable ionic charge distributions markedly due to a decrease In the Madelung energy in contrast to p-type GaN doped with only Be(Mg). Our calculations thus predict that the ''codoping me thod (doping n- and p-type dopants at the same time)'' is effective fo r the fabrication of high-conductivity p-type GaN with a wurtzite stru cture. (C) 1998 Elsevier Science B.V. All rights reserved.