S. Kobayashi et al., OPTICAL AND ELECTRICAL-PROPERTIES OF NANO-CRYSTALLINE GAN THIN-FILMS AND THEIR APPLICATION FOR THIN-FILM-TRANSISTOR, Journal of crystal growth, 190, 1998, pp. 749-752
Application of a nano-crystalline GaN to thin-film transistors is demo
nstrated. Two types of TFT structures, a bottom gate type and a top ga
te type, are examined. The held effect mobilities of the former and th
e latter type TFTs were 6 x 10(-2) and 19 cm(2)/V s: respectively. The
re results are explained by the high-volume fraction of nano-crystal a
nd the small deep gap state density at the free surface of nano-crysta
lline films from experimental results of structural, optical and elect
rical measurements. It is demonstrated that the nc-GaN TFT performance
is not influenced by white light irradiation of 1.2 mW/cm(2) except f
or a slight increase in the off-current. (C) 1998 Elsevier Science B.V
. All rights reserved.